Linewidth Microscope Measurement |
|
Line width |
1 .. 40 µm |
Magnifications |
2.5, 10, 20, 50, 100 |
Materials |
photoresist on silicon, photoresist on silicon dioxide, photoresist on silicon nitride, PMMA, silicon carbide, silicon dioxide, silicon nitride on silicon, silicon nitride on silicon dioxide |
Wafer size |
|
Equipment |
Leitz Ergolux Microscope |
Equipment characteristics: |
Batch sizes |
100 mm: 1, 150 mm: 1, 50 mm: 1, 75 mm: 1 |
Piece geometry Geometry of wafer pieces the equipment can accept |
circular, irregular, other, rectangular, triangular shard |
Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat, notched |
Wafer holder Device that holds the wafers during processing. |
metal chuck |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
gallium arsenide, gallium phosphide, indium phosphide, Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), sapphire, silicon, silicon carbide, silicon on insulator |