Register
or
Sign in
Advantages
Capabilities
Company
How to Start
About MEMS
Equipment
Name
↑
↓
4" hot plate
4-Point Probe
90 Degree Blue Oven
Acid hood
Acid/base wet bench
Acid/etch wet bench
ACS200 coater/developer
AG Heatpulse 210 Rapid Thermal Processing Systems
AG Heatpulse 610
Air Control Microvoid
AlN Sputterer
AMST Molecular Vapor Deposition System
AMT 8100
Applied Materials Precision 5000 (chamber A)
Applied Materials Precision 5000 (chamber B)
Applied Materials Precision 5000 (chamber C)
Applied Materials Precision 5000 (chamber D)
ASML 5500/90 DUV 4X stepper
ASML 5500/950B 193 nm Stepper
AT&T Double-sided prober
Baking oven
BCB cure oven
Blue M CC04-C-P-B
Brewer CEE100
CDE ResMap 168 Resistivity measurement
CEE 6000 Autocoating and Developing Tool
CEE Hotplate
Chemical-Mechanical Polisher
CMP wafer cleaner
CPA 9900 3-Target Sputtering System
Critical point dryer
Critical point dryer
Custom Cu plating bath
Dektak 6M
Dektak IIA
Dektak profilometer
Denton Discovery 24
Dicing Saw
Diffusion wet bench
Drytek1
Drytek2
DVI Discovery-18
EMS 1000
Enerjet
Enerjet E-beam
EV 501 bonder
EV420 mask aligner
EVG 501
EVG 501
EVG 501 (with alignment)
EVG 501 (without alignment)
EVG 620
Fisher oven
Flexus 2-300
Flexus F2320
Flip chip bonder
Fly-cutting machine
FNA1
FNA2
FNA3
FNB1
FNB2
FNB3
FPP-5000
FSM 3800
Gaertner Ellipsometer
Gaertner Scientific Ellipsometer
GCA 3600 DSW Projection Mask Aligner #1
GCA 3600 DSW Projection Mask Aligner #2
GCA 3600F PG
GCA 6200 Wafer Stepper
GCA 8500 wafer stepper (5x i-line)
GCA AS200 5x i-line stepper
GCA Autostep 200 DSW Stepper
General user wet bench
Gold Wirebonder
Gryphon Sputtering System
GSI ultradep
GSI Ultradep 1000
GSI ultratech
Headway Spinner
High Res 100
Hitachi 4700 FE
Hitachi S-4500 SEM
Hood #1
Hot Embosser
Hotplate
HTG Contact Aligner
Interserv IR maskmaker
Interserv PG
IPE PECVD
JEOL SEM
JVA CRL 1000B UV Flood Exposure System
Karl Suss Bond aligner
Karl Suss MA6
Karl Suss MA6 Contact Aligner
Karl Suss MA6 Contact Aligner
Karl Suss MA6 Mask Aligner
Karl Suss MA6 mask aligner
Karl Suss MJB3 Mask Aligner
KLA-Tencor Alpha-Step IQ surface profiler
Lam 4
LAM 4520XLe
Lam 490
Lam 490 Plasma Etcher
Lam 5
Lam 590 Plasma Etcher
Lam 690 Plasma Etch System
LAM 9400
LAM 9600
Leitz Ergolux
Leitz MV-SP
Leitz Optical Microscope
Leitz Secolux
Leitz SP
Leybold APS 1104
Lindberg furnace
Lindberg/Blue M mechanical oven
March asher
Matrix 106 Resist Removal System
Matrix Plasma Resist Stripper
Metal wet bench
Metallica Sputtering System
MFL furnace 323-2
Microautomation 1006 Dicing Saw
MicroAutomation dicing saw
Microvoid Fume Hood
MOS Process Hood #1
MPM TF-100
MRC Sputterer for Zinc Oxide
MRL Cyclone
MRL Cyclone -SiN
MRL furnace 321-1
MRL furnace 321-2
MRL furnace 321-3
MRL furnace 321-4
MRL furnace 322-1
MRL furnace 322-2
MRL furnace 322-3
MRL Furnace 322-4
MTI BCB coater
MTI Target Track resist coater
Nanometrics CTS-102
Nanometrics NanoSpec
Nanometrics NanoSpec/AFT 4000
Nanospec
NanoSpec Spectrophotometer
NanoSpec/AFT Model 010-180
NanoSpec/AFT Model 210XP
Nikon L-200 microscope
Nonmetal wet bench
Olympus microscope
Olympus microscope
OmniMap Prometrix
Oriel UV aligner
Orthodyne aluminum wirebonder
Oxford RIE
Oxford sputtering system
Parylene deposition system
Parylene deposition system
PDS 2010
PFC bench
Phi 5600 ESCA system
PHI 660 Scanning Auger Microprobe System
Philips XL-30 ESEM
Photoresist spinner
Plasma Asher
Plasma etcher
Plasma Therm 72 RIE
Plasma Therm 720
Plasma Therm SLR770 Bosch Etcher
Plasma Therm SLR770 Cl2 ICP
PlasmaTherm SL 700
Plating cell
Post-exposure bake oven
Prebake oven
Quintel UV Aligner
RCA hood
Reynols Tech hood
Rudolph ellipsometer
Rudolph Research AutoEL
Rudolph Research Ellipsometer
SemiGroup 1000
SemiGroup RIE
Silicide wet bench
Silicon organic wet bench
Singe oven
Sink 1
Sink 3
Sink 7
sink 7
Sink 8
SJ-20 evaporator
SMSI 3800
Solitec 5100
Solitec 5110-C
Solvent bench #1
Solvent wet bench
SP Acid #2 wet bench
SP acid #2 wet bench
spindryer3
Spinner
Strasbaugh 6EC
STS DRIE
STS advanced oxide etcher
STS Deep RIE
STS DRIE
STS PECVD
STS PECVD
STS RIE
Suss Microtec Contact aligner
SVG 8600 Photoresist Coat Track
SVG 8800 Photoresist coat and develop track
SVG Autocoater 8626
SVG developer
SVG-8132CTD Develop Track
Tegal 803
TEL Mark VII Coater and Developer
Temescal evaporator
Temescal FCE 2700A Evaporator
Tencor Alphastep 200
Tencor AS200
Tencor Flexus
Tencor P-1 Contact Profiler
Tencor RS35C
Thermal ace hotplate
Thermco Brute American XL-4000S-13 Model 4100 series
Thermco Mini-Brute III
Thermco TMX furnace (A-stack)
Thermco TMX furnace (A-stack, tube #4)
Thermco TMX furnace (B-stack)
Thermco TMX furnace (C-stack, tube #2)
Thermco TMX furnace (C-stack, tube #3)
Thermco TMX furnace (C-stack, tube #4)
Thermco TMX furnace (D-stack, tube #3)
Tylan Furnace (Boron diffusion, Tube #5)
Tylan Furnace (LTO, Tube #11)
Tylan Furnace (N2 anneal, Tubes #1 .. #4, #7)
Tylan Furnace (Nitride, tube #10)
Tylan Furnace (Oxidation, Tubes #1 .. #4)
Tylan Furnace (Phosphorus diffusion, Tube #6)
Tylan Furnace (Poly, Tube #9)
Tylan Furnace (Silicide, Tube #7)
Tylan/Tystar Furnaces
Tylan/Tystar Furnaces (Boron diffusion)
Tylan/Tystar Furnaces (dry oxidation)
Tylan/Tystar Furnaces (low-stress silicon nitride tube)
Tylan/Tystar Furnaces (LTO tube)
Tylan/Tystar Furnaces (phosphorus-doped polysilicon tube)
Tylan/Tystar Furnaces (PSG tube)
Tylan/Tystar Furnaces (SiC tube)
Tylan/Tystar Furnaces (silicon nitride tube)
Tylan/Tystar Furnaces (undoped polysilicon tube)
Tylan/Tystar Furnaces (wet oxidation)
Tystar furnace 20 (Ge / SiGe tube)
Ultrasonic Cleaner
Ultratech NanoTech 160 1X stepper
Ultratech XLS200 4X stepper
Ulvac Enviro
Unaxis SLR 720
Unaxis SLR730
UV Harden
UV Photostabilizer System
Vapor Priming Oven
Varian XM8 Sputterer
Veeco Connexion 800
Veeco Dektak 3030ST
Veeco Four Point Probe
Viscous flow reactor
VLSI sink 6
VLSI sink 8
VWR 1620 Bake Oven
Wafer dicing saw
Wet bench
wet bench
wet bench
Wet bench #1
wet bench (solvent)
wet bench I (acid bench)
wet bench/hot plate, heated bath with reflux
Wetbench
Wire bonder
Wyko Optical Profiler
X-ray beam line
Xenon Difluoride Etching System
YES Vapor Priming Oven
Yield Engineering Systems YES-3
Yield Vacuum Vapor Prime System (Model YES-5)
Zygo
10X stepper
ABM Contact aligner
Acid Bench
Acid bench
ACS200 Karl Suss wafer coater/developer
ADT7134
Aluminum etch bench
AMRAY 3600 Field Emission SEM
Anatech Plasma Cleaner
Applied Materials Centura 5200 etcher
ASML 2500/40 5X Stepper
ASML 5500/150 5X Stepper
ASML 5500/300 4X DUV Stepper
Automated Wire bonder
Automatic Parallel Seam Sealer
Bake oven
Batch Develop Tank
BHF bench
CDZ
Coater
Contact aligner
Custom PECVD
Custom Plating cell Model 1
Dataplate Hot Plate
DC magnetron
Deep RIE
Dektak
Dektak surface profilometer
Develop bench
Developer Bench
Developer Bench
Digital instruments AFM
Disco DAD 321 Automatic Dicer
E-beam evaporator
E-Beam Evaporator
E-beam evaporator
Electroplating Bench
Evaporator
EVG 301 Megasonic Cleaner
EVG 420 Aligner
EVG 501 Bonder
EVG 560
EVG aligner
Film Stress measurement tool
Furnace (N2 anneal)
Furnace (oxidation)
Furnace - Silicon
Furnace : Nitride
Furnace : Oxide
Headway spinner
HF bench
HMDS Prime oven
Hot phosphoric acid bench
Hot plate
hotplate
Hotplate
IMP electroless plating setup
IMP electroplating setup
IMP SF-100
Innovac sputter system
Interferometer Filmetrics
JEOL 6000 FSE
JEOL FE SEM
JEOL SEM
K&S 798 Automatic 8 inch wafer saw
Karl Suss MA6 Contact Aligner
Karl Suss RC8 Spinner
KLA Tencor P2
KOH etch bench
Lab-Line Oven
Lab-Line programmable oven
LMtec LPG
McBain Optical Microscope
Metal etch bench
Microwave bonder
Mitutoyo Contact Depth Gauge
Model 650 Hot-Filament Diamond Deposition System
MTI Multi-Fab Coater
Nanometrics NanoSpec
Nanometrics NanoSpec
Nanometrics NanoSpec
Nanospec
Nanospec
Nanospec 4150
Nickel etch bench
Optical microscope
Optical microscope
Oven
Oxford Plasmalab PECVD System
Oxidation furnace
Oxidation Furnace
PECVD
PECVD tool #1
Philips XL40 SEM
Photoresist Oven
Photoresist oven
Photoresist Spinner
Piranha Bench
Plasma Asher
Plasma asher
Plasma Cleaner (PEIIA)
Polyimide cure oven
Polyimide RIE
PTFE Vapor Deposition Coater
RCA Bench
Reactive Ion Etcher
Resist track
RVM Sputter Tool
Savannah 200
screen printer
SEM/ EDAX
Silicon Nitride LPCVD Furnace
Solitec photoresist spinner
Solvent bench
Solvent Bench I
Solvent Bench II
Spin coater (manual)
Sputter tool
Sputterer
STS DRIE
STS DRIE
STS RIE
STS SOI advanced Si etcher
STS-AOE
SVG 90 Series Coat/Develop Track
Table Top RIE
Technic Micro RIE 800
Temescal E-beam Evaporator
Tencor Alpha Surface profilometer
Tencor Alpha-step
TMAH etch bench
Torr Thermal Evaporator
Track Coater
Tystar Boron diffusion furnace
Tystar Oxidation Furnace
Tystar Oxide furnace
Tystar Phosphorus diffusion furnace
Ultrasonic bath
Ultratech XLS 7800 DUV Wafer Stepper
Ultratech XLS i-line Wafer Stepper
Ulvac
Unaxis RIE
Vacuum Reflow Furnace
Wafer bonder
Wafer dicing saw
Wafer saw
Wedge Bonder
Wet bech #1
Wet bench
Wet Bench
Wet bench #1
Wet bench II
Wet etch bench
x-tek Revolution
Yes 310 oven
YES HMDS Oven
YES Vacuum Oven
Zygo GPI Interferometer
Zygo New View Interferometer
4wave ion mill
Acid Wet Deck
Axcelis Down Stream Plasma Asher / Stripper
Blue M Bake Oven
BTI Horizontal Tube Furnace
CHA e-Beam Vacuum Evaporator System
Clean 100 Photoresist Bake Oven
Commonwealth Ion Mill
Custom Heidelberg laser writer
CVC 610
Disco Die Saw
Evatek -Batch dome
Fusion Photoresist UV Stabilizer
GCA 8500 DSW I-Line 5x Stepper
Headway Manual Spinner
Headway Programmable Photoresist Spinner
Heat Pulse 410 III-V Rapid Thermal Anneal
Heat Pulse 610 Dielectric Rapid Thermal Anneal
Heidelberg VPG200++
Hitachi SEM
Hotplate
Karl Suss BA6
Karl Suss MA6 Contact Aligner
Karl Suss SB6
KLA-Tencor P-15 stylus profilometer
Lam 590 Oxide / Nitride Etch
Leitz Ergolux Microscope
Manual Vapor Prime Spiner and Hot Plate
Metroline / IPC Plasma Photoresist Stripper
Metron 3290
Nanometrics NanoSpec 3000PHX
Oxford Plasmalab 100
Photoresist Spray Coater
Plasma Therm 770 Silicon DRIE (Bosch Process)
Plasma Therm 790+ Nitride / Oxide PECVD
Plasmalab MicroEtch
Primaxx HF Vapor etcher
Prometrics 4-point probe
PRS-3000 Wet Bench
PT Versaline DSE
Rudolph Ellipsometer
SemiTool SRD
STS -AOE
Suss ACS200 Wafer Coater / Developer
Tencor FLX 2908 Wafer Curvature (Stress) Measurement
Ulvac NE-550
Unaxis CLC 200
Unaxis VLR 700 Bosch Chamber
Unaxis VLR 700 PECVD
Varian 3190 DC magnetron sputterrer
Vistec e-beam
Vistec EBPG5000+ HR
VLR 700 Cluster - Fluorine Dielectric Etch Chamber
VLR 700 Cluster -Chlorine Etch Chamber
Wet bench
Wet Bench (acid)
Woollam Spectroscopic Ellipsometer
Xactix, XeF2 Isotropic Si Etch
Yeagle E-beam Evaporator
Advanced RIE etcher
Cole-Palmer ultrasonic bath
Constant temperature bath
Dual Column FIB
GT Technologies Supercritical CO2 Cleaner Dryer
Hitachi S-4700 SEM
Jenoptik Hex 03
Nikon Fluorescent Microscope
STS ASE DRIE
STS- AOE
Sun Ultra10
Tencor FLX-2320
Veeco Dektak 200SL
Veeco NT3300 profilometer
Wetbench