VLR 700 Cluster -Chlorine Etch Chamber
|Batch sizes||100 mm: 25|
List or range of wafer diameters the tool can accept
Types of wafers this equipment can accept
Device that holds the wafers during processing.
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
|quartz (fused silica), gallium phosphide, indium phosphide, gallium arsenide, silicon|
List or range of wafer thicknesses the tool can accept
|200 .. 700 µm|