VLR 700 Cluster -Chlorine Etch Chamber

Model VLR 700
Type commercial
Equipment Characteristics
Batch sizes 100 mm: 25
Wafer diameter(s)
List or range of wafer diameters the tool can accept
100 mm
Wafer geometry
Types of wafers this equipment can accept
Wafer holder
Device that holds the wafers during processing.
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
quartz (fused silica), gallium phosphide, indium phosphide, gallium arsenide, silicon
Wafer thickness
List or range of wafer thicknesses the tool can accept
200 .. 700 µm