Silicon Nitride LPCVD Furnace |
|
|---|---|
| Model | Mini Titan |
| Type | commercial |
| Equipment Characteristics | |
| Batch sizes | 100 mm: 25, 150 mm: 25, 75 mm: 25 |
| MOS clean | no |
| Wafer diameter(s) List or range of wafer diameters the tool can accept |
75 mm, 100 mm, 150 mm |
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat, notched |
| Wafer holder Device that holds the wafers during processing. |
quartz boat |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
germanium, sapphire, silicon, silicon carbide, silicon germanium, silicon on insulator, silicon on sapphire |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
100 .. 2500 µm |
