Plasma Therm 790+ Nitride / Oxide PECVD
|Batch sizes||100 mm: 9, 150 mm: 4, 200 mm: 1, 50 mm: 9, 75 mm: 9|
List or range of wafer diameters the tool can accept
|50 .. 200 mm|
Types of wafers this equipment can accept
|1-flat, 2-flat, notched, no-flat|
Device that holds the wafers during processing.
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
|gallium arsenide, indium phosphide, silicon, silicon carbide|
List or range of wafer thicknesses the tool can accept
|200 .. 700 µm|