Furnace (oxidation) |
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|---|---|
| Model | |
| Type | commercial |
| Comments | |
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| Equipment Characteristics | |
| Batch sizes | 100 mm: 25 |
| MOS clean | no |
| Wafer diameter(s) List or range of wafer diameters the tool can accept |
100 mm |
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat, notched |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon, silicon on insulator |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 800 µm |