Unaxis SLR730 |
|
|---|---|
| Alternate Name | Plasma Therm SLR730 |
| Manufacturer | Unaxis |
| Model | SLR730 |
| Type | commercial |
| Equipment Characteristics | |
| Batch sizes | 100 mm: 3, 125 mm: 3, 50 mm: 3, 75 mm: 3 |
| Wafer diameter(s) List or range of wafer diameters the tool can accept |
50 mm, 75 mm, 100 mm, 125 mm |
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat, notched |
| Wafer holder Device that holds the wafers during processing. |
aluminum chuck |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
alumina, Borofloat (Schott), ceramic, Corning 1737, fused silica, glass-ceramic, Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), sapphire, silicon, silicon carbide, silicon on insulator, silicon on sapphire, titanium |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
200 .. 1000 µm |