Oxford Plasmalab 100

Alternate Name Oxford ICP
Manufacturer Oxford
Model Plasmalab 100
Type commercial
Equipment Characteristics
Batch sizes 100 mm: 1, 150 mm: 1, 75 mm: 1
Wafer diameter(s)
List or range of wafer diameters the tool can accept
75 mm, 100 mm
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, notched, no-flat
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon carbide, silicon, silicon on insulator
Wafer thickness
List or range of wafer thicknesses the tool can accept
200 .. 1000 µm