Submitting Mask Designs

What mask file formats will the MEMS and Nanotechnology Exchange accept?

The MNX prefers to work with CIF or GDSII files.

AutoCAD files (DWG & DXF) are accepted.

Schematics (e.g. in PowerPoint, JPEG, etc.) can be uploaded.

The MNX can also assist users with adding alignment marks to the mask design for an additional fee.

How do I submit my mask design to the MEMS and Nanotechnology Exchange?

Please read our lithography templates before designing your mask.

When you have a mask design ready to submit, you can upload it to our server. The preferred way to upload files is to attach them to the appropriate run or step; follow the 'Files' link from the run to upload a file.

If you are concerned about uploading confidential data, we recommend that you digitally sign and encrypt your files using PGP or GnuPG before uploading them. Contact webmaster@mems-exchange.org for our public key.

In your description of the uploaded file, be sure to include the following information:

• name of uploaded CAD file
• process run number associated with the masks to be made, e.g. R0123
• name of the mask as it is to appear on the mask plate
• CAD layer ID
• CD (minimum feature size in layer)
• CD polarity; one of:
  dark: the minimum feature is on the drawn patterns
  clear: the minimum dimension is the spacing between drawn features
• mask polarity; one of:
  darkfield: digitized features are clear on mask plate
  clearfield: digitized features are opaque on the mask plate
• mask plate dimensions

What if I need help laying out the design mask for my process?

The MNX offers consulting services for mask design and layout. Please contact engineering@mems-exchange.org for information.

What if I have my mask design, but I need to have the mask plate made?

Mask making is a step that can be added to your run. Upload your design files in the run card and submit your run for review and pricing by an MNX engineer.

What if I already have the mask plate I want to use?

Once the run is approved and you are ready to proceed, please reference the run number and ship the mask to:

MEMS and Nanotechnology Exchange
1895 Preston White Drive, Suite 100
Reston, VA 20191-5434

Please note that we may or may not be able to use a mask provided by the customer depending on the photolithography tools to be used and the specifics of the process run. Please contact engineering@mems-exchange.org with the mask details to determine how to proceed.