Submitting Mask Designs
- What mask file formats will the MEMS and Nanotechnology Exchange accept?
The MNX prefers to work with CIF or GDSII files.
AutoCAD files (DWG & DXF) are accepted.
Schematics (e.g. in PowerPoint, JPEG, etc.) can be uploaded.
The MNX can also assist users with adding alignment marks to the mask design for an additional fee.
- How do I submit my mask design to the MEMS and Nanotechnology Exchange?
Please read our lithography templates before designing your mask.
When you have a mask design ready to submit, you can upload it to our server. The preferred way to upload files is to attach them to the appropriate run or step; follow the 'Files' link from the run to upload a file.
If you are concerned about uploading confidential data, we recommend that you digitally sign and encrypt your files using PGP or GnuPG before uploading them. Contact firstname.lastname@example.org for our public key.
In your description of the uploaded file, be sure to include the following information:
- name of uploaded CAD file
- process run number associated with the masks to be made, e.g. R0123
- name of the mask as it is to appear on the mask plate
- CAD layer ID
- CD (minimum feature size in layer)
- CD polarity; one of:
dark: the minimum feature is on the drawn patterns
clear: the minimum dimension is the spacing between drawn features
- mask polarity; one of:
darkfield: digitized features are clear on mask plate
clearfield: digitized features are opaque on the mask plate
- mask plate dimensions
- What if I need help laying out the design mask for my process?
The MNX offers consulting services for mask design and layout. Please contact email@example.com for information.
- What if I have my mask design, but I need to have the mask plate made?
Mask making is a step that can be added to your run. Upload your design files in the run card and submit your run for review and pricing by an MNX engineer.
- What if I already have the mask plate I want to use?
Once the run is approved and you are ready to proceed, please reference the run number and ship the mask to:
MEMS and Nanotechnology Exchange
1895 Preston White Drive, Suite 100
Reston, VA 20191-5434
Please note that we may or may not be able to use a mask provided by the customer depending on the photolithography tools to be used and the specifics of the process run. Please contact firstname.lastname@example.org with the mask details to determine how to proceed.