Process Hierarchy

  Isotropic wet etch
Process characteristics:
Depth
Depth to etch in material.
Depth
Depth to etch in material.
unconstrained
Etchant
Specify wet etchant (if known).
Etchant
Specify wet etchant (if known).
Material
Material to be etched.
Material
Material to be etched.
Minimum feature size (masked)
The dimension of the smallest masked feature to be protected during the etch.
Minimum feature size (masked)
The dimension of the smallest masked feature to be protected during the etch.
unconstrained
Minimum feature size (open)
The dimension of the smallest unmasked (open) feature to be etched.
Minimum feature size (open)
The dimension of the smallest unmasked (open) feature to be etched.
unconstrained
Sides processed both
Equipment