Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  RCA clean
Sides processed both
Equipment
Comments:
  • RCA cleaning is standard method used to clean silicon substrates. It contains both an organic and ionic cleaning step and sometimes an HF dip to remove native oxide.