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Capabilities
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How to Start
About MEMS
Layout generation: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
Layout generation
Process characteristics:
Time
Time
hour
must be 1 .. 40 hour
1 .. 40 hour
Batch size
1
Equipment
Comments:
Layout generation in GDSII or CIF formats.
Required time for layout will be determined on a case by case basis and will be charged at $200/hr.