1X maskmaking (Pattern Generation) |
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| Coating reflectivity Reflectivity of the mask coating |
0.48 |
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| Defect density Density (by area) of defects of a given size (e.g., 1dpsi@1.0um). |
< 0.05 pinholes/cm2 |
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| Feature geometry Shape of feature with dimensions characterized by the minimum feature size |
line |
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| Field geometry Shape of field with dimensions characterized by the maximum field size |
circle |
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| Min feature size |
1 µm |
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| Reduction |
1 |
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| Equipment |
Interserv PG |
| Equipment characteristics: |
| File formats List of CAD file formats supported (eg. GDSII, CIF) |
gdsII |
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| Mask coating Mask coating material (eg. chrome). |
chromium |
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| Mask plate dimensions Width, length, thickness of the mask plates (eg. 5x7x0.09 inch). |
4x4x0.09 inch, 5x5x0.09 inch |
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| Mask polarity Polarity of the mask. |
positive |
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| Max aperture size Size of pattern generator's maximum aperture (e.g., 1 mm) |
380x380 um |
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| Max field size |
127 mm |
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| Min aperture size Size of pattern generator's minimum aperture (e.g., 2 um) |
1x1 um |
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| Comments: |
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