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Process characteristics: |
1st bonded material Bondpad material on the die. |
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2nd bonded material Bondpad material on the package. |
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Number of bond wires Number of bond wires per chip. |
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Wire material Bond wire material. |
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Ambient Ambient to which substrate is exposed during processing |
air |
Batch size |
1 |
Excluded materials |
gold (category), copper |
Min bond pad size Minimum characteristic dimension of bond pad. |
100 µm |
Min bond pad spacing Minimum spacing between bond pads. |
100 µm |
Equipment |
Wire bonder |
Equipment characteristics: |
Die dimension Characteristic dimension of dies (e.g., side length of square) the equipment can accept |
3.75 inch |
Die materials List of allowed materials for dies accepted by this equipment |
alumina, silicon |
Comments: |
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Extra terms |
Customer agrees that wafers, masks, and other materials
incorporating any process(es) provided by this fabrication site
are to be used solely for non-commercial research
purposes.
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