Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  Ultrasonic clean
Process characteristics:
Process duration
Specify preferred cleaning time (if known).
Process duration
Specify preferred cleaning time (if known).
unconstrained
Temperature
Preferred cleaning temperature (if known).
Temperature
Preferred cleaning temperature (if known).
unconstrained
Sides processed both
Equipment
Comments:
  • The substrates are cleaned using a wet solution that is placed in an ultrasonic bath to provide intense agitation of the liquid.