5X reticle making (Pattern Generator) |
|
| Coating reflectivity Reflectivity of the mask coating |
0.48 |
|---|
| Defect density Density (by area) of defects of a given size (e.g., 1dpsi@1.0um). |
< 0.05 pinholes/cm2 |
|---|
| Feature geometry Shape of feature with dimensions characterized by the minimum feature size |
line |
|---|
| Field geometry Shape of field with dimensions characterized by the maximum field size |
circle |
|---|
| Min feature size |
1 µm |
|---|
| Reduction |
5 |
|---|
| Equipment |
Interserv PG |
| Equipment characteristics: |
| File formats List of CAD file formats supported (eg. GDSII, CIF) |
gdsII |
|---|
| Mask coating Mask coating material (eg. chrome). |
chromium |
|---|
| Mask plate dimensions Width, length, thickness of the mask plates (eg. 5x7x0.09 inch). |
4x4x0.09 inch, 5x5x0.09 inch |
|---|
| Mask polarity Polarity of the mask. |
positive |
|---|
| Max aperture size Size of pattern generator's maximum aperture (e.g., 1 mm) |
380x380 um |
|---|
| Max field size |
127 mm |
|---|
| Min aperture size Size of pattern generator's minimum aperture (e.g., 2 um) |
1x1 um |
|---|
| Comments: |
|
