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About MEMS
Surface fly-cutting: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
CMP
Lapping
Miscellaneous polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
on front
Surface fly-cutting
Process characteristics:
Thickness removed
Amount of material removed
Thickness removed
*
µm
nm
Amount of material removed, must be 0 .. 500 µm
0 .. 500 µm
Material
photoresist (category)
Sides processed
either
Wafer size
Wafer size
75 mm
100 mm
Equipment
Fly-cutting machine
Equipment characteristics:
Wafer geometry
Types of wafers this equipment can accept
no-flat, 1-flat, 2-flat, notched
Wafer holder
Device that holds the wafers during processing.
aluminum chuck
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
glass (category), Pyrex (Corning 7740), quartz (single crystal), silicon
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 1500 µm
Comments:
Used to trim the thickness of organic layers such as SU-8 and PMMA.
Precision: +/- 10um.