Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  Resist strip
Process characteristics:
Depth
Thickness of photoresist to remove.
Depth
Thickness of photoresist to remove.
unconstrained
Material
Material to be removed.
Material
Material to be removed.
Sides processed both
Equipment