Process Hierarchy

on front
  Spectroscopic Ellipsometric Multi-Point Film Thickness Measurement
Batch size 1
Film thickness 0.01 .. 2 µm
Materials PZT, aluminum nitride, silicon nitride on silicon, silicon dioxide on silicon
Refractive index 1 .. 4
Sides processed either
Wafer size
Wafer size
Equipment Woollam Spectroscopic Ellipsometer
Equipment characteristics:
Piece dimension
Range of wafer piece dimensions the equipment can accept
50 .. 150 mm
Piece geometry
Geometry of wafer pieces the equipment can accept
circular, irregular, other, rectangular
Piece thickness
Range of wafer piece thickness the equipment can accept
200 .. 700 µm
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon, silicon on insulator