Process Hierarchy

on front
  10X stepper G-line exposure Down
Magnification 10
Material OCG 825 35CS
Max field size 8.25 mm
Setup time 30 min
Sides processed either
Wavelength of light used during the exposure
436 nm
Wafer size
Wafer size
Equipment GCA 6200 Wafer Stepper
Equipment characteristics:
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat
Wafer holder
Device that holds the wafers during processing.
vacuum chuck
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 600 µm
  • Corners of field are cut off.