Process Hierarchy

  Photoresist wet strip
Batch size 25
Depth 0.1 .. 10 µm
Solutions and their concentrations.
sulfuric acid/hydrogen peroxide
Excluded materials gold (category), copper
Material photoresist (category)
Sides processed both
Temperature 60 .. 70 °C
Wafer size
Wafer size
Equipment Air Control Microvoid
Equipment characteristics:
Wafer holder
Device that holds the wafers during processing.
teflon carrier
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon, silicon dioxide, Borofloat (Schott), alumina
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 1000 µm
Extra terms