Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
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  SEM sample analysis
Process characteristics:
Duration
Duration os SEM inspection
Duration*
Duration os SEM inspection, must be 0.25 .. 100 hour
0.25 .. 100 hour
Batch size 1
Magnifications 20 .. 100000
Sides inspected
The sides of the wafer inspected by the process
 either
Wafer size
Wafer size
Equipment Hitachi S-4700 SEM
Equipment characteristics:
Piece dimension
Range of wafer piece dimensions the equipment can accept
 0 .. 4 inch
Piece geometry
Geometry of wafer pieces the equipment can accept
 rectangular, circular, triangular shard, irregular, other
Piece thickness
Range of wafer piece thickness the equipment can accept
 100 .. 10000 µm
Wafer geometry
Types of wafers this equipment can accept
 no-flat, 1-flat, 2-flat, notched
Wafer holder
Device that holds the wafers during processing.
 aluminum chuck
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
 alumina, germanium, glass (category), metal (category), Pyrex (Corning 7740), quartz (single crystal), sapphire, silicon, Borofloat (Schott), silicon dioxide, silicon germanium, silicon on insulator, silicon on sapphire
Wafer thickness
List or range of wafer thicknesses the tool can accept
 100 .. 10000 µm
Comments:
  • Minimum inspection duration: 15 min
  • Non-conductive samples
    require precoating of gold.
    Samples up to 3" inch diameter
    can be coated.