Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  Piranha/HF clean
  1 Piranha clean (MOS-clean)
  2 10:1 HF dip
Batch size 24
Setup time 30 min
Sides processed both
Wafer size
Wafer size
MOS clean yes
Comments:
  • This is the standard UCB pre-deposition/pre-oxidation clean.