Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  1X LPG L10 mask
Process characteristics:
Mask material
Mask material*
Mask plate dimension
Size of mask plate to be made
Mask plate dimension*
Size of mask plate to be made
Batch size 1
Critical dimension tolerance 0.5 µm
Defect density
Density (by area) of defects of a given size (e.g., 1dpsi@1.0um).
 0 > 5.0um
Magnification 1
Mask coating
Mask coating material (eg. chrome).
 chromium
Min feature size 3 µm
Equipment
Comments:
  • 7x7" mask on quartz is 0.15" thick.
  • 3um minimum line feature. No circles, rings, squares smaller than 5um.