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About MEMS
1X LPG mask (standard): View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
1X LPG mask (standard)
Process characteristics:
Mask material
Mask material
*
quartz (fused silica)
soda lime
Mask plate dimension
Size of mask plate to be made
Mask plate dimension
*
5x5x0.09"
7x7x0.12"
Size of mask plate to be made
Batch size
1
Critical dimension tolerance
0.5 µm
Defect density
Density (by area) of defects of a given size (e.g., 1dpsi@1.0um).
0 > 5.0um
Magnification
1
Mask coating
Mask coating material (eg. chrome).
chromium
Min feature size
3 µm
Equipment