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About MEMS
HF dip: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
Anisotropic etch
Deep RIE
Isotropic etch
Miscellaneous etch
Strip
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
HF dip
Depth
1 .. 30 nm
Etch type
wet isotropic
Etchant
Solutions and their concentrations.
HF/water [1:10]
Material
silicon dioxide
Sides processed
both
Temperature
25 °C
Wafer size
Wafer size
150 mm
Equipment
Wet bench #1
Equipment characteristics:
Batch sizes
150 mm: 25
MOS clean
no
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, no-flat
Wafer holder
Device that holds the wafers during processing.
teflon cassette
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
fused silica, Corning Eagle 2000, silicon, Corning 1737, silicon on insulator
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 675 µm