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4X DUV photolithography (SVGL Micrascan III): View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Contact mask lithography
Maskless lithography
Miscellaneous lithography
Projection mask lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
on front
4X DUV photolithography (SVGL Micrascan III)
Batch size
1
Batch sizes
150 mm: 12, 200 mm: 12
Magnification
4
Min feature size
0.25 µm
Sides processed
either
Wafer size
Wafer size
150 mm
200 mm
Equipment