Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  1X LPG mask (High resolution)
Process characteristics:
Mask material
Mask material*
Batch size 1
Critical dimension tolerance 0.25 µm
Defect density
Density (by area) of defects of a given size (e.g., 1dpsi@1.0um).
 0 > 5.0um
Magnification 1
Mask coating
Mask coating material (eg. chrome).
 chromium
Mask plate dimension 5x5x0.09"
Min feature size 1 µm
Equipment