Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
on front
  Chromium DC-magnetron sputtering (low power)
Process characteristics:
Thickness
Amount of material added to a wafer
Thickness*
Amount of material added to a wafer, must be 0.1 .. 2 µm
0.1 .. 2 µm
Ambient
Ambient to which substrate is exposed during processing
 vacuum
Deposition rate
Rate at which material is added to a wafer
 0.0192 µm/min
Excluded materials gold (category), copper
Material chromium
Microstructure chromium
Pressure
Pressure of process chamber during processing
 5 mTorr
Residual stress 227 MPa
Roughness
RMS roughness of a surface
 4.8 nm
Sides processed either
Temperature 27 °C
Wafer size
Wafer size
Equipment Denton Discovery 24
Equipment characteristics:
Batch sizes 100 mm: 1, 150 mm: 1
Wafer holder
Device that holds the wafers during processing.
 stainless steel
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
 alumina, Borofloat (Schott), silicon, silicon dioxide
Wafer thickness
List or range of wafer thicknesses the tool can accept
 300 .. 1000 µm
Comments:
  • This process uses a cathode power of 250W. An rf preclean can be performed prior to deposition. Residual stress and surface roughness values are from a 0.5 micron-thick film.
Extra terms
Customer agrees that wafers, masks, and other materials incorporating any process(es) provided by this fabrication site are to be used solely for non-commercial research purposes.