|
Sides processed |
both |
Temperature |
150 °C |
Thermal duration |
30 min |
Wafer size |
|
Equipment |
Baking oven |
Equipment characteristics: |
Wafer geometry Types of wafers this equipment can accept |
no-flat, 1-flat, 2-flat, notched |
Wafer holder Device that holds the wafers during processing. |
aluminum plate |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
glass (category), Pyrex (Corning 7740), quartz (single crystal), silicon |
Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 1500 µm |