Process Hierarchy

  Post-exposure bake
Ambient to which substrate is exposed during processing
Material AZ 5214
Sides processed both
Temperature 115 °C
Thermal duration 45 s
Wafer size
Wafer size
Equipment Thermal ace hotplate
Equipment characteristics:
Wafer geometry
Types of wafers this equipment can accept
no-flat, 1-flat, 2-flat, notched
Wafer holder
Device that holds the wafers during processing.
stainless steel
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
glass (category), Pyrex (Corning 7740), quartz (single crystal), silicon, silicon on insulator
Wafer thickness
List or range of wafer thicknesses the tool can accept
100 .. 500 µm