Process Hierarchy

on front
  Photoresist spin coat
Process characteristics:
must be 1 .. 10 µm
1 .. 10 µm
Sides processed either
Wafer size
Wafer size
Equipment Photoresist spinner
Equipment characteristics:
Wafer geometry
Types of wafers this equipment can accept
no-flat, 1-flat, 2-flat, notched
Wafer holder
Device that holds the wafers during processing.
aluminum chuck
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
Pyrex (Corning 7740), quartz (single crystal), silicon
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 1000 µm