|
Material |
HMDS |
Temperature |
140 °C |
Thickness |
100 Å |
Wafer size |
|
Equipment |
Suss ACS200 Wafer Coater / Developer |
Equipment characteristics: |
Batch sizes |
100 mm: 25, 150 mm: 25, 75 mm: 25 |
Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat |
Wafer holder Device that holds the wafers during processing. |
cassette |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon on insulator, silicon |
Wafer thickness List or range of wafer thicknesses the tool can accept |
274 .. 700 µm |