|
Sides processed |
both |
Temperature |
110 °C |
Thermal duration |
15 min |
Wafer size |
|
Equipment |
Oven |
Equipment characteristics: |
Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat |
Wafer holder Device that holds the wafers during processing. |
wafer boat |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
quartz (single crystal), silicon on insulator, silicon, Pyrex (Corning 7740) |
Wafer thickness List or range of wafer thicknesses the tool can accept |
100 .. 2000 µm |