Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  KOH decontamination clean
  1 HCl bath (Potassium clean)
  2 Photoresist strip (non-metal)
Materialphotoresist (category)
Batch size 25
Wafer size
Wafer size
Comments:
  • Required on wafers exposed to KOH prior to any SNF furnace process.