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About MEMS
Solder deposition: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Evaporation
LPCVD
Low-stress SiN deposition
Miscellaneous deposition
Oxidation
PECVD
Spin casting
Sputtering
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
on front
Solder deposition
Process characteristics:
Thickness
Thickness of film to be deposited
Thickness
*
Å
µm
nm
Thickness of film to be deposited, must be 1 .. 100 µm
1 .. 100 µm
Material
gold
Sides processed
either
Equipment