Process Hierarchy

on front
  Photoresist coat (AZ HiR 1075)
Process characteristics:
must be 0.65 .. 1 µm
0.65 .. 1 µm
Material AZ HiR 1075
Sides processed either
Temperature 90 .. 120 °C
Wafer size
Wafer size
Equipment TEL Mark VII Coater and Developer
Equipment characteristics:
Batch sizes 150 mm: 1
MOS clean no
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
fused silica, Corning Eagle 2000, silicon, Corning 1737, silicon on insulator
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 675 µm