Process Hierarchy

on front
  Amorphous silicon PECVD
Process characteristics:
Amount of material added to a wafer
Amount of material added to a wafer, must be 0.05 .. 2 µm
0.05 .. 2 µm
Ambient to which substrate is exposed during processing
silane, helium
Material amorphous silicon
Microstructure amorphous
Sides processed either
Temperature 400 °C
Wafer size
Wafer size
Equipment PECVD tool #1
  • Call for 300mm
Equipment characteristics:
Batch sizes 100 mm: 25, 150 mm: 25, 200 mm: 25
MOS clean no
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, notched, no-flat
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
quartz (fused silica), silicon, Pyrex (Corning 7740), quartz (single crystal), silicon on insulator
Wafer thickness
List or range of wafer thicknesses the tool can accept
200 .. 1000 µm