Register
or
Sign in
Advantages
Capabilities
Company
How to Start
About MEMS
Photoresist Spray Coat: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Evaporation
LPCVD
Low-stress SiN deposition
Miscellaneous deposition
Oxidation
PECVD
Spin casting
Sputtering
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
Photoresist Spray Coat
Process characteristics:
Thickness
Thickness
*
µm
must be 0.5 .. 2.1 µm
0.5 .. 2.1 µm
Material
AZ 5214e
Wafer size
Wafer size
100 mm
150 mm
Equipment
Photoresist Spray Coater
Equipment characteristics:
Batch sizes
100 mm: 1, 150 mm: 1
MOS clean
no
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, no-flat
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon on insulator, Pyrex (Corning 7740), fused silica, silicon
Wafer thickness
List or range of wafer thicknesses the tool can accept
20 .. 800 µm