Photoresist hardbake (110 degC) |
|
Ambient Ambient to which substrate is exposed during processing |
air |
Batch size |
24 |
Pressure Pressure of process chamber during processing |
1 atm |
Sides processed |
both |
Temperature |
110 °C |
Thermal duration |
30 min |
Wafer size |
|
Equipment |
Lindberg/Blue M mechanical oven |
Equipment characteristics: |
Wafer holder Device that holds the wafers during processing. |
quartz boat |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon, glass (category) |
Wafer thickness List or range of wafer thicknesses the tool can accept |
200 .. 800 µm |
Comments: |
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