on front HMDS prime (manual) |
|
Batch size |
1 |
Material |
HMDS |
Pressure Pressure of process chamber during processing |
1 atm |
Sides processed |
either |
Temperature |
25 °C |
Wafer size |
|
Equipment |
Solitec 5100 |
Equipment characteristics: |
Wafer holder Device that holds the wafers during processing. |
vacuum chuck |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon, glass (category) |
Wafer thickness List or range of wafer thicknesses the tool can accept |
200 .. 800 µm |
Comments: |
|