| Dry/wet/dry oxidation |
| Indium Tin Oxide (ITO) DC-magnetron sputtering |
| Nichrome DC-magnetron sputtering (high power) |
| Nichrome DC-magnetron sputtering (low power) |
| Nickel DC-magnetron sputtering (high power) |
| Nickel DC-magnetron sputtering (low power) |
| PSG LPCVD |
| Palladium DC-magnetron sputtering |
| Phosphorus-doped polysilicon LPCVD |
| Platinum DC-magnetron sputtering (high power) |
| Platinum DC-magnetron sputtering (low power) |
| Silicon dioxide PECVD (TEOS) |
| Silicon nitride LPCVD |
| Silicon nitride PECVD |
| Titanium DC-magnetron sputtering (high power) |
| Titanium DC-magnetron sputtering (low power) |
| Titanium/nickel DC-magnetron sputter |
| Tungsten DC-magnetron sputtering (high power) |
| Tungsten DC-magnetron sputtering (low power) |
| Undoped polysilicon LPCVD |
