| PTFE Deposition |
| Dry oxidation |
| E-beam metal evaporation (Temescal) |
| Low Stress silicon nitride LPCVD (300 MPa) |
| Metal sputter deposition (Veeco) |
| Reactive Evaporation - Optical film coating (Leybold APS 1104) |
| Silicon Nitride PECVD (STS) |
| Silicon dioxide PECVD (STS) |
| Stoichiometric silicon nitride LPCVD |
| TEOS LPCVD |
| TEOS PECVD (STS) |
| Undoped polysilicon LPCVD |
| Wet oxidation |
| E-beam Evaporation (Au) |
| E-beam Evaporation (Cr) |
| E-beam Evaporation (Pt) |
| E-beam Evaporation (Ti) |
| Aluminum DC-magnetron sputtering |
| Silicon dioxide PECVD (TEOS) |
| Silicon nitride PECVD |
